以第一或者通讯作者发表的代表性论文:
1. Developing Fatigue-Resistant Ferroelectrics using Interlayer Sliding Switching, Science, 385, 57-62 (2024).
2. Self-powered Photo-pyroelectric Sensing in Antiferroelectric HZO Memory with Asymmetric van der Vaals Electrodes, Nature Communications, 17, 861 (2026).
3. Polarity-dependent Ferroelectric Modulations in Two-dimensional Hybrid Perovskite Heterojunction Transistors, Nature Communications, 16, 9382 (2025).
4. Tailoring Tin-based Perovskite Crystallization via Large Cations and Pseudo-Halide Anions for High Mobility and High Stable Transistors, Science Advances, 11, eadv4138 (2025).
5. Low-Dimensional Templates and Delayed Crystallization for High-Quality Tin-Based Perovskite Films and High-Performance Transistors, Nature Communications, 16, 9505 (2025).
6. Emergence of Ferroelectricity in Sn-based Perovskite Semiconductor Films by Iminazole Molecular Reconfiguration, Nature Communications, 16, 365 (2025).
7. Configurable Kinetics of Polarization Switching via Ion Migration in Ferroionic CuInP2S6, Nature Communications, 16, 4462 (2025).
8. Hidden Structural Phase Transition Assisted Ferroelectric Domain Orientation Engineering in Hf0.5Zr0.5O2 Films, Nature Communications, 16, 4232 (2025).
9. Observation and Manipulation of Two-Dimensional Topological Polar Texture Confined in Moiré Interface, Nature Communications, 16, 3026 (2025).
10. Unveiling the Polarization Switching Pathway Through Tetragonal Phase as a Metastable Intermediate State in Ferroelectric HfxZr1-xO2 Thin Film, Nature Communications, 16, 8188 (2025).
11. Silicon-van der Waals Heterointegration for CMOS-Compatible Logic-in-Memory Design, Science Advances, 9, eadk1597 (2023).
12. Programmable Ferroelectric Bionic Vision Hardware with Selective Attention for High-Precision Image Classification, Nature Communications, 13, 7019 (2022).
13. Oxidation-Bootsted Charge Trapping in Ultra-Sensitive van der Waals Materials for Artificial Synaptic Features, Nature Communications, 11, 2972 (2020).
14. A 1013-Cycle Fatigue-Free HZO Ferroelectric Enabled by Oxygen-Gradient Engineering for Reliable Low-Voltage FeFETs, IEEE International Electron Devices Meeting (IEDM), 2026.
代表性科研项目:
1. 国家自然科学基金-联合基金重点项目(U25A20482):高端集成电路制程的硅晶体生长及缺陷表征技术,项目负责人。
2. 国家自然科学基金-面上项目(62374043):二维硫族化合物晶体管的电荷注入和输运机理研究,项目负责人。
3. 国家自然科学基金-面上项目(61774061):基于肖特基结的低功耗与高增益聚合物晶体管及其集成电路应用研究,项目负责人。
4. 国家自然科学基金-NSAF联合基金(U1830130): 多价态金属氧化物混合相光学常数、相变规律和能带结构的光谱研究,项目负责人。
5. 国家自然科学基金-青年科学基金(61504043): 二维过渡金属硫化物的光电子特性及其外场调控,项目负责人。
6. 上海市基础研究特区计划(25TQ001): 基于声表面波技术的二维铁电材料多维度探测与调控,项目负责人。
7. 上海市自然科学基金-探索类项目(19ZR1473400):基于范德华异质集成的二维隧穿电子器件,项目负责人。
代表性授权发明专利:
1.平面型忆阻器阻变类型的调控方法, 授权专利号:ZL202310905342.7
2. 一种石墨烯为源漏电极的二维薄膜晶体管及制备方法,授权专利号:ZL202011163303.7
3. 基于模板生长的钙钛矿薄膜晶体管及其制备方法,授权专利号:ZL202410347431.9
4. 基于三氧化钼接触掺杂的p型有机薄膜晶体管及制备方法,授权专利号:ZL202110370278.8
5.一种改进亚阈值摆幅和开关比的有机薄膜晶体管及制备方法,授权专利号:ZL201910401316.4
6.一种高分子聚合物薄膜晶体管及其制备方法,授权专利号:ZL201910264205.3
7.一种低亚阈值摆幅的氧化铟薄膜晶体管的制备方法,授权专利号:ZL201810410340.X
8. 一种掺镍氧化铜薄膜晶体管及制备方法,授权专利号:ZL201810754806.8
9. 一种掩膜版与样品的贴合及分离装置,授权专利号:ZL201710196782.4
10. 一种用于热蒸发镀膜仪的防污染窗口,授权专利号:ZL201710358616.X
软件著作权:
1. 二维半导体晶体管电学性能模型软件
2. 有机晶体管电学性能分析软件